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High-k Gate Dielectrics for CMOS Technology精编
Brochure
More information from /reports/2253866/
High-k Gate Dielectrics for CMOS Technology
Description: A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a
fundamental and a technological
viewpoint, summarizing the latest research results and development solutions. As such, the book clearly
discusses the advantages of these
materials over conventional materials and also addresses the issues that accompany their integration into
existing production technologies.
Aimed at academia and industry alike, this monograph combines introductory parts for newcomers to the
field as well as advanced sections
with directly applicable solutions for experienced researchers and developers in materials science, physics
and electrical engineering.
Contents: Preface XV
List of Contributors XVII
Color Plates XXIII
Part One Scaling and Challenge of Si-based CMOS 1
1 Scaling and Limitation of Si-based CMOS 3
Gang He, Zhaoqi Sun, Mao Liu, and Lide Zhang
1.1 Introduction 3
1.2 Scaling and Limitation of CMOS 4
1.3 Toward Alternative Gate Stacks Technology 16
1.4 Improvements and Alternative to CMOS Technologies 22
1.4.1 Improvement to CMOS
1.5 Potential Technologies Beyond CMOS 23
1.6 Conclusions 24
References 25
Part Two High-k Deposition and Materials Characterization 31
2 Issues in High-k Gate Dielectrics and its Stack Interfaces 33
Hong-Liang Lu and David Wei Zhan
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