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Coater / Developer System Latest Technology
October 17th , 2019
Hiromitsu Maejima
Clean Track Marketing
Tokyo Electron Limited
Hiromitsu Maejima / Tokyo Electron Limited 1
Outline
1. EUV technology improvement work
• In film particle reduction
• CDU improvement
• Pattern collapse reduction
2. Coater/Developer system latest technology
• Rapid detection
• Autonomous control
3. Summary
Hiromitsu Maejima / Tokyo Electron Limited 2
EUV technology improvement work
Hiromitsu Maejima / Tokyo Electron Limited 3
EUV patterning performance improvement using equipment set
Coater/Developers
Plasma Etch
EUV
System
Exposure
Coat
Develop
Single Wafer Thermal
Deposition
Deposition Processing
System System Dry Etch Cleaning
System
Anneal Surface
Wet Planarization
Clean
Hiromitsu Maejima / Tokyo Electron Limited 4
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